CVD Diamonds

Chemical vapor deposition (CVD) growth is a method usinga Microwave Plasma Reactor to create thin layer of diamond on a heated diamond substrate (Seed)by exposing it to volatile precursor gases (Oxygen, Hydrogen, Methane &Nitrogen)that react or break down on the surface, building up a uniform layer atom by atom while gas flows sweep away unwanted byproducts.
The most popular System is the 6 Kilowatt-2.45Gigahertz System using a growth surface of 2 to 3.5 Inches, 10 Kilowatt-2.45 Gigahertz System using a growth surface of 3 to 6 Inches or the robust 915 Megahertz-25KW-75KW System using a growth surface of 6 to 15 Inches.